Grain Size and Orientation Control

The microstructure of the target has the most direct and important effect on the target sputtering performance. There are two principle indicators to measure the target microstructure: grain size and orientation. The control method of these two indicators is the core technology in sputtering target production.

KFMI have systematically developed independent intellectual property rights on grain size and orientation control of sputtering targets. High-purity metal will be processed with well designed Thermo-Mechanical Processes and detected using various high precision instruments, such as metallographic microscope, XRD and EBSD to confirm the qualified microstructure of targets for sputtering requirement.